Back-Gate Modulation in UTB GeOI pMOSFETs With Advanced Substrate Fabrication Technique.
In: IEEE Transactions on Electron Devices, Jg. 65 (2018-03-01), Heft 3, S. 895-900
Online
academicJournal
In this paper, the back-gate modulation in ultrathin body germanium-on-insulator (UTB GeOI) p-channel metal-oxide-semiconductor field-effect transistors (pMOSFETs) has been investigated. Based on the direct wafer boding and polishing technique, high-performance 20-nm-thick GeOI pMOSFETs have been fabricated. Peak hole mobility of 158 cm²/V · s and high-field mobility ( Ns = 1 x 1013 cm-2) of 121 cm²/V · s are obtained, respectively. The back-gate modulation in UTB GeOI pMOSFETs has been systematically investigated by experiments and simulations. For the case that the back channel does not form, the carrier distributions in the front channel become wider with larger negative back-gate voltage Vbg applied. As a result, the mobility increases because of the reduced scattering in the whole Ns range. When Vbg is negative enough, the back channel forms. In this case, the modulation effect would be strongly affected by the carrier transport properties at the back channel. [ABSTRACT FROM AUTHOR]
Titel: |
Back-Gate Modulation in UTB GeOI pMOSFETs With Advanced Substrate Fabrication Technique.
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Autor/in / Beteiligte Person: | Zheng, Zejie ; Yu, Xiao ; Zhang, Yanyan ; Xie, Min ; Cheng, Ran ; Zhao, Yi |
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Zeitschrift: | IEEE Transactions on Electron Devices, Jg. 65 (2018-03-01), Heft 3, S. 895-900 |
Veröffentlichung: | 2018 |
Medientyp: | academicJournal |
ISSN: | 0018-9383 (print) |
DOI: | 10.1109/TED.2018.2798407 |
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